MATERIAL FOR PURIFICATION OF SEMICONDUCTOR POLISHING SLURRY, MODULE FOR PURIFICATION OF SEMICONDUCTOR POLISHING SLURRY AND PROCESS FOR PRODUCING SEMICONDUCTOR POLISHING SLURRY

摘要

A material for purification of semiconductor polishing slurry that without changing of pH value, is capable of efficiently purifying a polishing slurry to thereby not only prevent metal contamination of a polished object as effectively as possible but also achieve recycling of polishing slurry without any problem; a relevant module for purification of semiconductor polishing slurry; and a process for producing a semiconductor polishing slurry with the use thereof. In particular, a material for purification of semiconductor polishing slurry characterized in that it comprises a fibrous substrate having a functional group capable of forming a metal chelate or such a functional group together with hydroxyl fixed onto at least surface thereof. This material for purification of semiconductor polishing slurry is, for example, used in such a manner that it is inserted in a container fitted with polishing slurry inflow port and outflow port while ensuring passage of polishing slurry flow.