发明名称 POLYIMIDE SILICONE-BASED RESIN COMPOSITION OF NON-SOLVENT TYPE AND RESIN FILM GIVEN BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a polyimide resin composition comprising a polyimide silicone-based resin composition which gives high adhesion to base materials having various shapes and does not require a removing process of a solvent, after coating or other operations, and having such a structure that discoloration of the polyimide silicone resin does not disturb light absorption of a phoytopolymerization initiator. SOLUTION: This resin composition of non-solvent type contains at least (a) a polyimide silicone resin, (b) a reactive diluent, and (c) the photopolymerization initiator, wherein the polyimide silicone resin (a) has repeating units expressed by general formula (1-1) (X is a tetravalent organic group; and Y is a bivalent organic group) and general formula (1-2) (Z is a bivalent organic group having an organosiloxane part) and has a light transmittance of≥80% which is measured at a wavelength of 350 nm to 450 nm after the composition is formed into a film having a thickness of 100μm on a quartz glass base plate. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005330479(A) 申请公布日期 2005.12.02
申请号 JP20050122570 申请日期 2005.04.20
申请人 SHIN ETSU CHEM CO LTD 发明人 YONEDA YOSHIAKI;SUGAO MICHIHIRO
分类号 C08F2/44;C03C17/30;C08F2/50;C08F287/00;C08L79/08;C09D183/10;C09J183/10;(IPC1-7):C08F2/44 主分类号 C08F2/44
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