FILM DEPOSITION SOURCE, VACUUM FILM DEPOSITION APPARATUS, ORGANIC EL PANEL MANUFACTURING METHOD, AND ORGANIC EL PANEL

摘要

PROBLEM TO BE SOLVED: To realize a film deposition capable of obtaining excellent pattern forming precision or uniform film thickness. SOLUTION: The film deposition source 10 of the vacuum film deposition apparatus to deposit a thin film on a film deposition surface 1a of a substrate 1 comprises a material storage unit 11 to store a film deposition material, a heating means 12 to heat the film deposition material in the material storage unit 11, and a film deposition flow control unit 13 which is provided on an outlet of the material storage unit 11 to control the direction of the film deposition flow. The film deposition flow control unit 13 gives high directivity to the film deposition flow in the moving direction (X direction) to the film deposition source 10 of the film deposition surface 1a. COPYRIGHT: (C)2006,JPO&NCIPI