Method and apparatus for qualitatively analyzing uniformity in microelectromechanical devices

摘要

The method and apparatus of the invention qualitatively evaluate the product quality of a wafer having microelectromechanical devices that have deflectable reflective planar members using an optical technique. At least three wafer images are captured for different reflected light from different spatial directions. The brightness of the captured images is compared between the captured images so as to obtain qualitative information of the deflection distribution of the deflectable members. The qualitative information can be used as basis for further product quality analysis or as standard for determining whether to discard the product.