| 摘要 |
PROBLEM TO BE SOLVED: To provide an immersion aligner capable of performing good projection exposure, and preventing the degradation of optical characteristics caused by dirt adhesion on the optical device surface of a projection optical system. SOLUTION: The aligner is provided with an illumination optical system for illuminating reticle with light from a light source, and a projection optical system for projecting the pattern of reticle on a substrate. It is an aligner for exposing the substrate by the pattern via an immersion agent wherewith the gap is filled up between the projection optical system device arranged proximately and the substrate. It comprises an optical surface protective member for protecting the optical surface of an optical device, and the protective member removing mechanism for detaching and attaching the optical surface protective member from/to the projection optical system. COPYRIGHT: (C)2006,JPO&NCIPI |
