PHOTOSENSITIVE POLYMER HAVING CYCLIC BACKBONE AND RESIST COMPOSITION COMPRISING THE SAME

摘要

A RESIST COMPOSITION INCLUDING (A) A PHOTOSENSITIVE POLYMER FOR USE IN A CHEMICALLY AMPLIFIED RESIST AND REPRESENTED BY THE FOLLOWING FORMULA:FOMULA I WHERE R1 IS A C1 TO C20 ALIPHATIC HYDROCABON, R2 IS T-BUTYL, TETRAHYDROPYRANYL OR 1- ALKOXY ETHYL, L/(L+M+N) IS 0.0~0.4, M/(l+M+N) IS 0.5, AND N/(L+M+N) IS 0.1~0.5, AND (B) A PHOTOACID GENERATOR (PAG).