PLASMA CVD APPARATUS AND PLASMA SURFACE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus which produces an electrode having excellent electron emission characteristics.

SOLUTION: A substrate 1 is mounted on a mount surface of an anode 11a in a chamber 10. A flow path 13a is formed in a cathode 13 facing the anode, and cooling water is circulated therethrough. A voltage is applied across the anode 11a and the cathode 13 to form a layer of carbon nanowall on the substrate 1 by plasma, and thereafter the anode 11a is cooled by a cooling member 12 to rapidly cool the substrate 1 to a predetermined temperature.

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