发明名称 CHLORINE INJECTION RATE SETTING METHOD, CHLORINE INJECTION RATE SETTING DEVICE AND CHLORINE INJECTION RATE SETTING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a chlorine injection rate setting method, a chlorine injection rate setting device and a chlorine injection rate setting system, for facilitating setting by an operator, when determining the optimum chlorine injection rate, in management of a residual chlorine concentration in a water purification plant.SOLUTION: A chlorine injection rate setting method when injecting chlorine into treatment water in a water purification plant, includes at least a difference calculation step for calculating a difference of a residual chlorine concentration between a day time and a night time on the basis of a water temperature of the treatment water, and an injection rate setting step for setting the residual chlorine concentration in the day time by adding the difference to the residual chlorine concentration in the night time.SELECTED DRAWING: Figure 1
申请公布号 JP2016168572(A) 申请公布日期 2016.09.23
申请号 JP20150051429 申请日期 2015.03.13
申请人 TOSHIBA CORP 发明人 ARIMURA RYOICHI;EBIHARA SATOMI;KUROKAWA FUTOSHI;HOKARI KEIJI;SUGINO TOSHIHARU
分类号 C02F1/50;C02F1/76;G01N33/18 主分类号 C02F1/50
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