| 发明名称 |
MASK, METHOD FOR MANUFACTURING THE SAME, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask for suppressing deformation of a pattern caused by radiation heat of illumination light for exposure. <P>SOLUTION: A transmissive reticle R1 to be irradiated with illumination light IL includes a glass blank 5 transmitting the illumination light IL and provided on one surface with a pattern of shield film 9 of a predetermined transmittance for attenuating the illumination light IL, and a single- or multi-layered reflection film 8 higher in reflectance to the illumination light IL than the shield film 9 formed at least in an area between the shield film 9 and the glass blank 5. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
| 申请公布号 |
JP2009162851(A) |
申请公布日期 |
2009.07.23 |
| 申请号 |
JP20070339813 |
申请日期 |
2007.12.28 |
| 申请人 |
NIKON CORP |
发明人 |
ISHIKAWA JUN;HOSHINO EIICHI |
| 分类号 |
G03F1/46 |
主分类号 |
G03F1/46 |
| 代理机构 |
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代理人 |
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| 主权项 |
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