发明名称 |
MONITORING THICKNESS UNIFORMITY |
摘要 |
Devices, methods, and systems for monitoring thickness uniformity are described herein. One system includes a transmitter configured to transmit a signal through a portion of a material while the material is moving, an attenuator configured to absorb a first portion of the transmitted signal, a reflector configured to reflect a second portion of the transmitted signal, a receiver configured to receive the reflected signal, and a computing device configured to determine a thickness of the portion of the material based on a time delay between the transmission of the signal and the reception of the reflected signal |
申请公布号 |
US2017097231(A1) |
申请公布日期 |
2017.04.06 |
申请号 |
US201615279862 |
申请日期 |
2016.09.29 |
申请人 |
Honeywell International Inc. |
发明人 |
Peczalski Andrzej;Nusseibeh Fouad |
分类号 |
G01B15/02;G01S13/88 |
主分类号 |
G01B15/02 |
代理机构 |
|
代理人 |
|
主权项 |
1. A system for monitoring thickness uniformity, comprising:
a transmitter configured to transmit a signal through a portion of a material while the material is moving; an attenuator configured to absorb a first portion of the transmitted signal; a reflector configured to reflect a second portion of the transmitted signal; a receiver configured to receive the reflected signal; and a computing device configured to determine a thickness of the portion of the material based on a time delay between the transmission of the signal and the reception of the reflected signal. |
地址 |
Morris Plains NJ US |