发明名称 Semiconductor device
摘要 A semiconductor device includes a semiconductor substrate having a first conductivity type, an epitaxial layer having a second conductivity type, an isolation area in the epitaxial layer to define an active area of the semiconductor substrate, a body area having a first conductivity type and a drift area having a second conductivity type adjacent to each other in the epitaxial layer, a LOCOS insulating layer in the drift area and surrounded by the drift area, a drain area adjacent to a side part of the LOCOS insulating layer and surrounded by the drift area, a body contact area and a source area in the body area and surrounded by the body area, and a gate area overlapping the drift area and a part of the LOCOS insulating layer from a direction of the body area.
申请公布号 US9627492(B2) 申请公布日期 2017.04.18
申请号 US201514964758 申请日期 2015.12.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Kim Minhwan;Jung Jaehyun;Kim Jungkyung;Lee Kyuok;Jang Jaejune;Jeon Changki;Cho Suyeon;Ko Seonghoon;Cho Kyu-Heon
分类号 H01L29/66;H01L29/40;H01L29/423;H01L29/78;H01L29/06 主分类号 H01L29/66
代理机构 Lee & Morse P.C. 代理人 Lee & Morse P.C.
主权项 1. A semiconductor device, comprising: a semiconductor substrate having a first conductivity type; an epitaxial layer having a second conductivity type on the semiconductor substrate; an isolation area in the epitaxial layer to define an active area of the semiconductor substrate; a body area having a first conductivity type and a drift area having a second conductivity type, the body area and the drift area being adjacent to each other in the epitaxial layer; a local oxidation of silicon (LOCOS) insulating layer in the drift area, side and lower surfaces of the LOCOS insulating layer being surrounded by the drift area; a drain area adjacent to a side part of the LOCOS insulating layer, side and lower surfaces of the drain area being surrounded by the drift area; a body contact area and a source area in the body area, side and lower surfaces of the body contact area and the source area being surrounded by the body area; and a gate area overlapping the drift area and a part of the LOCOS insulating layer from a direction of the body are, wherein the gate area includes a plurality of bar shaped portions extending from the direction of the body area, the bar shaped portions being spaced apart from each other, and a portion of the LOCOS insulating layer being exposed between the spaced bar shaped portions.
地址 Suwon-Si, Gyeonggi-Do KR