发明名称 Nonvolatile memory integrated circuit with built-in redundancy
摘要 According to one embodiment, a semiconductor integrated circuit includes a memory cell including first and second electrodes and a resistance change film therebetween, and a control circuit controlling a potential difference between the first and second electrodes. The control circuit reversibly changes the memory cell to a first resistive state by applying a first potential to the first electrode and by applying a second potential smaller than the first potential to the second electrode. The control circuit reversibly changes the memory cell to a second resistive state by applying a third potential to the first electrode and by applying a fourth potential smaller than the third potential to the second electrode.
申请公布号 US9620203(B2) 申请公布日期 2017.04.11
申请号 US201514849047 申请日期 2015.09.09
申请人 Kabushiki Kaisha Toshiba 发明人 Peng Haiyang;Zaitsu Koichiro;Yasuda Shinichi
分类号 G11C11/00;G11C11/36;G11C13/00;G11C17/16;G11C17/18;G11C29/00 主分类号 G11C11/00
代理机构 Finnegan, Henderson, Farabrow, Garrett & Dunner LLP 代理人 Finnegan, Henderson, Farabrow, Garrett & Dunner LLP
主权项 1. A semiconductor integrated circuit comprising: a memory cell including first and second electrodes and a resistance change film therebetween, the resistance change film being reversibly changeable between first and second resistive states; and a control circuit controlling a potential difference between the first and second electrodes, wherein the control circuit reversibly changes the memory cell to the first resistive state by applying a first potential to the first electrode and by applying a second potential smaller than the first potential to the second electrode, the control circuit reversibly changes the memory cell to the second resistive state by applying a third potential to the first electrode and by applying a fourth potential smaller than the third potential to the second electrode, and the control circuit irreversibly fixes the memory cell to a third resistive state by applying a fifth potential to the first electrode and by applying a sixth potential greater than the fifth potential to the second electrode.
地址 Tokyo JP