发明名称 |
SELF-ALIGNED HETEROJUNCTION FIELD EFFECT TRANSISTOR |
摘要 |
A junction field effect transistor (JFET) comprises an insulating carrier substrate, a base semiconductor substrate formed on the insulating carrier substrate and a gate region formed on the base semiconductor substrate. The gate region forms a junction with the base semiconductor substrate. The JFET further comprises a first source/drain region formed on the base semiconductor substrate and located on a first side of the gate region and a second source/drain region formed on the base semiconductor substrate and located on a second side of the gate region. A gate stack is deposited on the gate region, a first source/drain stack is deposited on the first source/drain region and a second source/drain stack is deposited on the second source/drain region. At least one of the gate stack, first source/drain stack and second source/drain stack overlaps onto another one of the gate stack, first source/drain stack and second source/drain stack. |
申请公布号 |
US2017125607(A1) |
申请公布日期 |
2017.05.04 |
申请号 |
US201514931307 |
申请日期 |
2015.11.03 |
申请人 |
International Business Machines Corporation |
发明人 |
Hekmatshoartabari Bahman;Shahidi Ghavam G.;Sun Yanning |
分类号 |
H01L29/808;H01L29/06;H01L29/66;H01L29/10;H01L29/417;H01L27/12;H01L29/04;H01L29/423;H01L21/283 |
主分类号 |
H01L29/808 |
代理机构 |
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代理人 |
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主权项 |
1. A junction field effect transistor comprising:
an insulating carrier substrate; a base semiconductor substrate formed on the insulating carrier substrate; a gate region formed on the base semiconductor substrate wherein the gate region forms a junction with the base semiconductor substrate; a first source/drain region formed on the base semiconductor substrate and located on a first side of the gate region; a second source/drain region formed on the base semiconductor substrate and located on a second side of the gate region; and a gate stack deposited on the gate region, a first source/drain stack deposited on the first source/drain region and a second source/drain stack deposited on the second source/drain region wherein at least one of the gate stack, first source/drain stack and second source/drain stack overlaps onto another one of the gate stack, first source/drain stack and second source/drain stack. |
地址 |
Armonk NY US |