发明名称 SELF-ALIGNED HETEROJUNCTION FIELD EFFECT TRANSISTOR
摘要 A junction field effect transistor (JFET) comprises an insulating carrier substrate, a base semiconductor substrate formed on the insulating carrier substrate and a gate region formed on the base semiconductor substrate. The gate region forms a junction with the base semiconductor substrate. The JFET further comprises a first source/drain region formed on the base semiconductor substrate and located on a first side of the gate region and a second source/drain region formed on the base semiconductor substrate and located on a second side of the gate region. A gate stack is deposited on the gate region, a first source/drain stack is deposited on the first source/drain region and a second source/drain stack is deposited on the second source/drain region. At least one of the gate stack, first source/drain stack and second source/drain stack overlaps onto another one of the gate stack, first source/drain stack and second source/drain stack.
申请公布号 US2017125607(A1) 申请公布日期 2017.05.04
申请号 US201514931307 申请日期 2015.11.03
申请人 International Business Machines Corporation 发明人 Hekmatshoartabari Bahman;Shahidi Ghavam G.;Sun Yanning
分类号 H01L29/808;H01L29/06;H01L29/66;H01L29/10;H01L29/417;H01L27/12;H01L29/04;H01L29/423;H01L21/283 主分类号 H01L29/808
代理机构 代理人
主权项 1. A junction field effect transistor comprising: an insulating carrier substrate; a base semiconductor substrate formed on the insulating carrier substrate; a gate region formed on the base semiconductor substrate wherein the gate region forms a junction with the base semiconductor substrate; a first source/drain region formed on the base semiconductor substrate and located on a first side of the gate region; a second source/drain region formed on the base semiconductor substrate and located on a second side of the gate region; and a gate stack deposited on the gate region, a first source/drain stack deposited on the first source/drain region and a second source/drain stack deposited on the second source/drain region wherein at least one of the gate stack, first source/drain stack and second source/drain stack overlaps onto another one of the gate stack, first source/drain stack and second source/drain stack.
地址 Armonk NY US