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发明名称
ELECTROPHORETIC PHOTORESIST COMPOSITION AND A METHOD OF FORMING ETCH RESISTANT MASKS
摘要
申请公布号
US3738835(A)
申请公布日期
1973.06.12
申请号
USD3738835
申请日期
1971.10.21
申请人
IBM,US
发明人
BAKOS P,US
分类号
G03F7/038;G03F7/16;(IPC1-7):G03C1/68;G03C5/00
主分类号
G03F7/038
代理机构
代理人
主权项
地址
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