发明名称 |
UNGATED FET METHOD FOR MEASURING INTEGRATED CIRCUIT PASSIVATION FILM CHARGE DENSITY |
摘要 |
<p>An ungated FET having an annular drain surrounding a central source is formed on a test site on the same semiconductor chip with product FET devices. All FETs are covered with a passivating film whose charge level is to be determined. An off-chip operational amplifier circuit is connected to the ungated FET to provide automatically whatever source-to-substrate bias is required to cause a negligibly small source-to-drain current, e.g., 0.5 microamps to flow. The potential difference between the source and substrate is measured while the aforesaid negligibly small source-to-drain current is flowing. The charge level in the passivating material covering the product FET devices as well as the ungated FET device is calculated using the measured source-to-substrate bias.</p> |
申请公布号 |
CA958074(A) |
申请公布日期 |
1974.11.19 |
申请号 |
CA19720156422 |
申请日期 |
1972.11.14 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LEONE, LOUIS W.;MORANGE, THEODORE A.;REILLY, DONLAD F.;SCHRAM, PAUL J. |
分类号 |
G01R31/26;G01R31/316;H01L21/66;H01L29/78 |
主分类号 |
G01R31/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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