发明名称 |
Microlithography projection optical system, tool and method of production |
摘要 |
A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength λ from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of face shifting masks as objects to be imaged, in particular for EUV wavelengths. |
申请公布号 |
US9482961(B2) |
申请公布日期 |
2016.11.01 |
申请号 |
US201414496367 |
申请日期 |
2014.09.25 |
申请人 |
Carl Zeiss SMT GmbH |
发明人 |
Mann Hans-Juergen;Ulrich Wilhelm |
分类号 |
G03B27/42;G03F7/20;G02B17/08;G03F1/62 |
主分类号 |
G03B27/42 |
代理机构 |
Fish & Richardson P.C. |
代理人 |
Fish & Richardson P.C. |
主权项 |
1. An optical system, comprising:
a plurality of optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane, wherein a path of the radiation of the system has chief rays that are at an angle of 3° or more with respect to a normal at the object plane, the image field has a minimum radius of 300 mm, at the object plane all chief rays are parallel to each other within 0.5° , and the system is a microlithography projection optical system. |
地址 |
Oberkochen DE |