Capacitive sensor sheet and production method thereof

摘要

A production method of a capacitive sensor sheet, comprising: a film forming step forming of a optically-transparent electroconductive film 11 on the surface of a substrate 2 having optical transparency; a supplemental electrode forming step of setting an electrode region 3a which functions as the transparent electrode 3 at least in part of the film 11, and laminating a supplemental electrode 4a which has a lower electrical resistance than the electrical resistance of the film 11 to cover at least part of a periphery of the electrode region 3a; a wire forming step of laminating a wire 4b in which one end thereof is connected to the supplemental electrode 4a on the film 11; a resist laminating step of laminating a resist 12 to cover all of the electrode region 3a and at least part of the supplemental electrode 4a; and a conductive film removing step of removing a part of the film 11 formed on the substrate 2 having optical transparency placed at a position not overlapping with the resist 12, the supplemental electrode 4a, or the wire 4b.

主权项

1. A production method of a capacitive sensor sheet, the production method comprising:
a film forming step of forming an optically-transparent electroconductive film on at least one surface of a substrate having optical transparency; a supplemental electrode and a wire forming step of setting an electrode region which functions as a transparent electrode at least in part of the optically-transparent electroconductive film, by laminating a layer which is part of a supplemental electrode to cover at least part of a periphery of the electrode region, the supplemental electrode having a lower electrical resistance than the electrical resistance of the optically-transparent electroconductive film on top of the optically-transparent electroconductive film, and laminating the layer which is part of a wire in which one end thereof is connected to the supplemental electrode on the optically-transparent electroconductive film; a resist laminating step of laminating a resist to cover all of the electrode region and at least part of the supplemental electrode; and an electroconductive film removing step of removing, by plasma etching, a part of the optically-transparent electroconductive film formed on the substrate at a position of the electroconductive film not overlapped by the resist, the supplemental electrode and the layer, wherein the optically-transparent electroconductive film overlapped by the layer has the same pattern as the layer after the plasma etching of the electroconductive film removing step.