发明名称 LIGHT FLUX FOCUSING SYSTEM FOR EXPOSURE
摘要 PURPOSE:To provide a light flux focusing system for exposure of a copying machine for electronic photography, in which the opening of a shielding member having both sides opened is varied by the use of an arm member to change the slit breadth so as to obtain the proper conditions for the exposure.
申请公布号 JPS5273025(A) 申请公布日期 1977.06.18
申请号 JP19750148797 申请日期 1975.12.13
申请人 RICOH KK 发明人 YANAGAWA NOBUYUKI;WATANABE TSUTOMU
分类号 G03B27/50;G03G15/04;G03G15/043 主分类号 G03B27/50
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