发明名称 |
LIGHT FLUX FOCUSING SYSTEM FOR EXPOSURE |
摘要 |
PURPOSE:To provide a light flux focusing system for exposure of a copying machine for electronic photography, in which the opening of a shielding member having both sides opened is varied by the use of an arm member to change the slit breadth so as to obtain the proper conditions for the exposure. |
申请公布号 |
JPS5273025(A) |
申请公布日期 |
1977.06.18 |
申请号 |
JP19750148797 |
申请日期 |
1975.12.13 |
申请人 |
RICOH KK |
发明人 |
YANAGAWA NOBUYUKI;WATANABE TSUTOMU |
分类号 |
G03B27/50;G03G15/04;G03G15/043 |
主分类号 |
G03B27/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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