ETCHING METHOD OF SEMICONDUCTOR SUBSTRATES,申请号JP19770032197-传众专利搜索

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发明名称	ETCHING METHOD OF SEMICONDUCTOR SUBSTRATES
摘要
申请公布号	JPS53117975(A)	申请公布日期	1978.10.14
申请号	JP19770032197	申请日期	1977.03.25
申请人	HITACHI LTD	发明人	TAKAHASHI YUKIO
分类号	H01L21/308;H01L21/302	主分类号	H01L21/308
代理机构		代理人
主权项
地址

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