发明名称 |
PROCESS FOR CHEMICAL-MECHANICAL POLISHING OF III-V SEMICONDUCTOR MATERIALS |
摘要 |
<p>PROCESS FOR CHEMICAL-MECHANICAL POLISHING OF III - V SEMICONDUCTOR MATERIALS Method for combined chemical-mechanical polishing of III - V semiconductor planar surfaces by applying a weak aqueous hydrochloric acid solution in combination with an aqueous source of chlorine to the surface to be polished while simultaneously mechanically polishing the surface.</p> |
申请公布号 |
CA1044580(A) |
申请公布日期 |
1978.12.19 |
申请号 |
CA19750242676 |
申请日期 |
1975.12.29 |
申请人 |
MONSANTO COMPANY |
发明人 |
WALSH, ROBERT J. |
分类号 |
H01L21/304;H01L21/306;H01L21/308;(IPC1-7):01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|