| 摘要 |
PURPOSE:To make possible easy production of +5 deg.X-cut flat face and side face electrodes by photolithograpy techniques and achieve the improvement in various characteristics and the reduction in size and cost by differing the materials of side face part electrode film and flat face part electrode film. CONSTITUTION:Flat face electrode patterns are formed through negative resist 4 on flat-face form turning fork patterns 3 of chrome, gold thin films which become a mask at the tuning fabrication on a crystal substrate 1 and a protective film 5 is formed by the positive photoresist on the resist 4. Thereafter, side face electrodes 3b are formed of nichrome, palladium or other by using a metal mask. Next, the nichrome, palladium 3b' having been deposited on the flat face part at the forming of the resist 5 and electrodes 3b are removed. Next, with the resist 4 as a mask, the chrome, metal films 3 are etched and the resist 4 is removed to obtain the flat face electrodes 3a. The electrodes 3a and 3b are connected near 3c the fork part. |
