Method to form dual channel group III-V and Si/Ge FINFET CMOS and integrated circuit fabricated using the method

摘要

A method includes providing a structure having a substrate, a first insulating layer on the substrate, a first semiconductor material layer on the first insulating layer, a second insulating layer on the first semiconductor layer in a first portion of the structure and a second semiconductor layer of a second, different semiconductor material on the second insulating layer in the first portion. The method further includes growing additional first semiconductor material on the first semiconductor layer in a second portion of the structure forming a regrown semiconductor layer; forming first fins in the regrown semiconductor layer and second fins in the second semiconductor layer; and forming gate structures upon the first and second fins. A height difference, relative to a surface of the first insulating layer, of the gate structures formed upon the first fins and the gate structures formed upon the second fins is less than a predetermined value.

主权项

1. A structure, comprising:
a substrate, a first electrically insulating layer overlying a surface of the substrate, a first semiconductor layer comprised of a first semiconductor material overlying a surface of the first electrically insulating layer, the first semiconductor layer having a first thickness, a second electrically insulating layer overlying the first semiconductor layer in a first portion of the structure, and a second semiconductor layer comprised of a second semiconductor material different from the first semiconductor material overlying the second electrically insulating layer in the first portion, the second semiconductor layer having a second thickness that is greater than the first thickness; additional first semiconductor material grown on the first semiconductor layer in a second portion of the structure to form a regrown semiconductor layer having a third thickness; first fins formed in the regrown semiconductor layer and second fins formed in the second semiconductor layer; and gate structures disposed upon and orthogonal to the first fins and the second fins, where the second fins that are disposed beneath the gate structures are disposed over both: (a) that portion of the second electrically insulating layer that is disposed in the first portion of the structure and (b) that portion of the first semiconductor layer that is disposed beneath the second electrically insulating layer in the first portion of the structure, and where a difference in height, relative to the surface of the first electrically insulating layer, of the gate structures formed upon the first fins and the gate structures formed upon the second fins is less than a predetermined value.