EXPOSURE TO ELECTRON BEAM,申请号JP19780072931-传众专利搜索

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发明名称	EXPOSURE TO ELECTRON BEAM
摘要
申请公布号	JPS551110(A)	申请公布日期	1980.01.07
申请号	JP19780072931	申请日期	1978.06.16
申请人	FUJITSU LTD	发明人	OSADA TOSHIHIKO
分类号	H01L21/027;H01L21/30	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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