FORMING METHOD OF PHOTO RESIST PATTERN,申请号JP19790018496-传众专利搜索

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发明名称	FORMING METHOD OF PHOTO RESIST PATTERN
摘要
申请公布号	JPS55111133(A)	申请公布日期	1980.08.27
申请号	JP19790018496	申请日期	1979.02.21
申请人	TOKYO SHIBAURA ELECTRIC CO	发明人	NAKADA KIMIO;HIRAKAWA YOSHITO
分类号	H01L21/30;H01L21/027	主分类号	H01L21/30
代理机构		代理人
主权项
地址

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