| 摘要 |
PURPOSE:To mitigate degradation of yield and reliability when a pattern matched exposing process is performed by providing a substrate supportor which has the highest part at its center and radial concave area of which shape is parabola or its like. CONSTITUTION:A surface of a supportor 6 on which a substrate is to be supported is shaped to be a part of sphere's surface and has the highest point at its center and plural number of concave areas of which shape is parabola extending from its circumference to the center. Therefore a substrate 4 which is loaded on the supportor 6 and fitted with vacuum suction it forced to fit a face of the support, and when the substrate 4 is fitted to a mask 3 with a cylinder 7 a void which is filled with air is not left at the cenral area and no partial pattern defect can occur. After exposure 2 when the mask and the substrate are separated deformation is eliminated and atmospheric air intrudes to he interior, and no attaching action exists. Therefore a photoresist film which is applied in a thin film on the surface of the substrate 4 can not be removed, and no partial pattern defect can occur. |
