| 摘要 |
PURPOSE:To enable one to adjust the capacity of a capacitor provided on a hybrid IC without damage to the wiring by a method wherein when the capacitor is coated with a photoresist film and a part of the film is removed to adjust the capacity of the capacitor, a diaphragm is provided at the position of image formation of an objective of a microscope and ultraviolet rays are applied to the capacitor. CONSTITUTION:The surface of the hybrid IC 7 on which the capacitor 10 is formed is coated with a photoresist film and is exposed by the use of a mask, a part of the upper electrode of the capacitor 10 is removed by the etching method, and the capacity of the capacitor is adjusted. To accomplish such a purpose, the circuit 7 is placed on the X-Y table 8, the microscope 1 that is equipped with the eye-piece 9, half-mirror 3, objective 2, ultraviolet ray source 4 and the shutter 5 is provided above the table 8, the resist film is exposed on observing the circuit 7 by means of the lens 9. In this way, the diaphragm 6 is installed between the shutter 5 and the half-mirror 3, and the diameter of the diaphragm 6 is changed according to the exposed area not to apply ultraviolet ray to other range. |
