发明名称 MOVING METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER
摘要 PURPOSE:To eliminate the need for the mechanical strength of the moving track and to prevent the breakage of a wafer by moving the wafer by means of the liquid injected from nozzles, and washing and scrubbing while moving. CONSTITUTION:A moving track comprises moving blocks coupled together. The moving block is a cage body in whose upper surface a groove is formed. On the bottom surface of the groove, nozzles 24 are arranged so as to be inclined to the progress direction 26 of a wafer 25. The water fed through a pipe 27 and having filled space 28 is injected from the nozzles 24 to push the lower surface of the wafer 25 to float as well as advance in the moving direction. On the other hand, in the moving process, the upper surface of the wafer 25 is washed by a medical fluid from upper nozzles and scrubbed by brushes through the fluid. The constitution permits a mechanically inferior material to be used for the moving track, and prevents the breakage of the wafer due to moving regardless of its enlarging diameter.
申请公布号 JPS5645017(A) 申请公布日期 1981.04.24
申请号 JP19790120060 申请日期 1979.09.20
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 NIBARI IKUO
分类号 H01L21/677;H01L21/02;H01L21/027;H01L21/30;H01L21/304;(IPC1-7):01L21/02 主分类号 H01L21/677
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