| 摘要 |
PURPOSE:To expand driving margin by making the width of patterns at both or either one of upper and lower sides of a pattern column less than that of the center part. CONSTITUTION:On a (YSmLuCa)3(FeGe)5O12 film grown on GGG, hard bubbles are suppressed by a YIG thin layer and on it, a stretcher part of 12mum in pitch (P1), 1mum in gap (G1), 3mum in pattern width (W1), and 90 deg. in vertical angle, for example, is formed through an Al2O3 film; and pattern width W2 of 10 stages at both end parts of the pattern column is set to 2.5mum which is less than pattern widt W1 of 300 stages at the center part. Consequently, the driving margin is expanded by lowering the lower limit of a driving bias. |
