| 摘要 |
PURPOSE:To make it possible to manufacture the object wherein a barrier layer comprises a very thin film, by changing the sputtering conditions. CONSTITUTION:The Josephson element is manufactured by using the first process by which a first superconductive layer is formed on a substrate, a second process by which the barrier layer is formed on said superconductive layer, and a third process by which a second superconductive layer is formed on said barrier layer. In the first and third processes, is used a target comprising an oxide superconductive material BaPb1-xBixO3 (0.05<x<0.3). Sputtering is performed in mixed atmosphere of argon and oxygen wherein the rate of oxygen is 30-60% under the atmospheric pressure of 4-10X10<-2> Torr. Then heat treatment is performed and the first superconductive layer is formed. In the second process, a target comprising the oxide superconductive material is used, the sputtering is performed in the mixed atmosphere of argon and oxygen wherein the rate of oxygen is 10% or less under atmospheric pressure of 1-10X10<-2> Torr, and the barrier layer is formed. The second superconductive layer is formed by the same method as the formation of the first conductive layer. |
