| 摘要 |
PURPOSE:To obtain a homogeneous thin film, by dripping photo resist from a plurality of drip outlets onto a wafer fixed on a rotary shaft and thereafter rotating at a high speed. CONSTITUTION:After fixing the wafer 2 on the rotary shaft 1, the photo resist comes out from drip outlets in a suitable amount being dripped on the wafer 2. In this device, since the photo resist simultaneously comes out from the plurality of drip outlets 3, a drip required amount can be instantaneously obtained, and the volatilization of solvent in the photo resist causing the formation of an inhomogeneous thin film can be sufficiently prevented. Besides, a photo resist thin film can be formed homogeneously to the periphery because of a high speed rotation. |
