Substrate processing apparatus, substrate transfer method and substrate transfer device

摘要

A substrate processing apparatus can prevent photo-corrosion of, e.g., copper interconnects due to exposure of a surface to be processed of a substrate to light, and can perform processing, such as cleaning, of a substrate surface while preventing photo-corrosion of, e.g., copper interconnects due to exposure to light. The substrate processing apparatus includes a plurality of processing areas housing therein processing units which have been subjected to light shielding processing; and at least one transfer area housing therein a transfer robot and disposed between two adjacent ones of the plurality of processing areas. A light shielding wall is provided between the transfer area and each of the two adjacent processing areas, and a light-shielding maintenance door is provided for the front opening of the transfer area. The processing units are coupled to the light shielding walls in a light-shielding manner.

主权项

1. A substrate processing apparatus for processing a substrate comprising:
a housing having an interior which is divided by partition walls into sections; a first processing area which has been subjected to light shielding processing, the first processing area being located in one of the sections of the housing; a second processing area which has been subjected to light shielding processing, the second processing area being located in the one of the sections of the housing; a transfer area which has been subjected to light shielding processing, the transfer area being located in the one of the sections of the housing and being located between the first processing area and the second processing area; a first light shielding wall provided between the first processing area and the transfer area, the first light shielding wall having a plurality of first openings through which the substrate is transferred; a plurality of processing units vertically arranged in the first processing area, each of the processing units having been subjected to light shielding processing, and each of the processing units being configured to include a box-like housing composed of a light shielding material, the box-like housing being configured to house a processing machine, wherein a substrate insertion opening is formed in a sidewall of the box-like housing; the substrate insertion opening is provided in a position facing a respective first opening of the first light shielding wall; and the box-like housing is coupled to the first light shielding wall in a light shielding state; a second light shielding wall provided between the second processing area and the transfer area, the second light shielding wall having a plurality of second openings through which the substrate is transferred; a plurality of processing units vertically arranged in the second processing area, each of the processing units having been subjected to light shielding processing, and each of the processing units being configured to include a box-like housing composed of a light shielding material, the box-like housing being configured to house a processing machine, wherein a substrate insertion opening is formed in a sidewall of the box-like housing; the substrate insertion opening is provided in a position facing a respective second opening of the second light shielding wall; and the box-like housing is coupled to the second light shielding wall in a light shielding state; and a plurality of maintenance doors provided in the housing and configured to be open for performing maintenance of the first processing area, the second processing area, or the transfer area, the maintenance doors being made of a light shielding member; wherein the transfer area has a transfer robot to transfer the substrate from any of the plurality of processing units of the first processing area or the plurality of processing units of the second processing area to the transfer area; and wherein each of the first light shielding wall, the second light shielding wall, the plurality of processing units in the first processing area and the plurality of processing units in the second processing area are configured such that, in a state in which one of the maintenance doors is open for performing maintenance of one of the plurality of processing units in the first processing area or one of the plurality of processing units in the second processing area, external light is prevented from entering the other processing units and the transfer area; wherein, for each of the plurality of processing units in the first processing area, the substrate insertion opening is provided with an openable/closable shutter; and a light shielding film is mounted to the sidewall of the housing of the processing unit surrounding a periphery of the substrate insertion opening, and is coupled to the first light shielding wall; and wherein, for each of the plurality of processing units in the second processing area, the substrate insertion opening is provided with an openable/closable shutter; and a light shielding film is mounted to the sidewall of the housing of the processing unit surrounding a periphery of the substrate insertion opening, and is coupled to the second light shielding wall.