发明名称 METHOD FOR MEASURING FILM THICKNESS
摘要 PURPOSE:To measure the thickness of a film with high accuracy, by irradiating characteristic X rays which produce easily non-interference scattering to a material consisting of a coat containing a light element and a base material having a small generating factor of the non-interference scattering and then selecting and detecting scattered X rays. CONSTITUTION:The Lalpha rays of Rh are irradiated from an X-ray generating source 4 to a sample 3 having a coat of polyester resin formed on an aluminum substrate. A part of scattered or radiated X rays is led to a spectral crystal 6 via a solar slit 5, and only X rays of a waveform which is slightly shifted toward a long wavelength and obtained by giving the non-interference scattering to the Lalpha rays of Rh is led to an X-ray detector 7. The output pulses delivered from the detector 7 are supplied to a scaler/timer 9 via an amplifier 8 to be counted. This count value signal is compared with the stored value of thickness of the film produced based on the measuring data of scattering intensity through an arithmetic storage device 10. Thus the film thickness value is detected and displayed to a display 11. In such a way, the thickness of a coated film is measured with high accuracy.
申请公布号 JPS58135407(A) 申请公布日期 1983.08.12
申请号 JP19820008616 申请日期 1982.01.22
申请人 NIHON ETSUKUSUSEN KK 发明人 MIURA HITOSHI;MAKABE TAKAO
分类号 G01B15/02;G01N23/203 主分类号 G01B15/02
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