SENSOR SYSTEM, SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
摘要
A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.
申请公布号
SG11201606867Q(A)
申请公布日期
2016.09.29
申请号
SG11201606867Q
申请日期
2015.03.02
申请人
ASML NETHERLANDS B.V.
发明人
LOF, JOERI;KAUFFMAN, JOOST;PETERS, MARTIN, DIETER, NICO;RUTGERS, PETRUS, THEODORUS;STOPEL, MARTIJN, HENDRIKUS, WILHELMUS;VAN DEN EIJKEL, GERARD;VAN DER SCHOOT, HARMEN, KLAAS;VISSER, RAIMOND