发明名称 |
COMPUTER CONTROLLED SYSTEM AND PROCESS FOR PROCESSING SEMICONDUCTOR WAFERS |
摘要 |
<p>Automated reactor system and process for etching or otherwise processing semiconductor wafers in a plasma environment. The wafers are carried into and out of a reaction chamber by a conveyor and processed on an individual basis. Within the chamber, an electrode mounted on a swinging arm carries each wafer from the conveyor to a processing position adjacent to a stationary electrode. Gas is admitted to the chamber, and the electrodes are energized to ionize the gas and form a plasma for processing the wafer between the electrodes.</p> |
申请公布号 |
CA1161966(A) |
申请公布日期 |
1984.02.07 |
申请号 |
CA19810377728 |
申请日期 |
1981.05.15 |
申请人 |
BRANSON INTERNATIONAL PLASMA CORPORATION |
发明人 |
DAVIES, JOHN T.;REICHELDERFER, RICHARD F. |
分类号 |
H01L21/302;B65G49/07;C23C16/50;C23F1/08;C30B33/00;H01L21/00;H01L21/205;H01L21/3065;H01L21/31;H01L21/67;(IPC1-7):C23C15/00;H01L21/306 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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