SUBSTRATE LIQUID PROCESSING APPARATUS, AND CONTROL METHOD OF HEATER UNIT

摘要

A control device configured to control a power to be supplied to a heater unit. The control device cuts off the power to be supplied to a heating portion when it is determined that an event where a maximum temperature that the processing liquid within the heater unit reaches exceeds a processing liquid upper limit temperature is likely to occur even when a supply of the power to the heating portion is stopped based on an actual temperature of the processing liquid measured by a temperature detector under an assumption that a flow of the processing liquid flowing in a processing liquid supply line is stopped.

主权项

1. A liquid processing apparatus comprising:
a processing liquid supply line configured to supply a processing liquid from a processing liquid source to a workpiece; a heater unit including a heating portion configured to heat the processing liquid flowing in the processing liquid supply line; a control device configured to control a power to be supplied to the heating portion; and a temperature detector configured to measure a temperature of the processing liquid flowing in the processing liquid supply line, wherein the control device performs a cut-off control that cuts off the power to be supplied to the heating portion when it is determined that the temperature of the processing liquid within the heater unit is equal to or higher than a processing liquid upper limit temperature when a supply of the power to the heating portion is stopped, and the determination as to whether the temperature of the processing liquid within the heater unit is equal to or higher than the processing liquid upper limit temperature is made based on an actual temperature of the processing liquid measured by the temperature detector under an assumption that a flow of the processing liquid flowing in the processing liquid supply line is stopped.