| 摘要 |
PURPOSE:To form an EC layer of high performance by performing the formation of an electrochromic (EC) layer in the manufacture of titled element by using a reactive ion plating device under specified conditions. CONSTITUTION:A transparent substrate 1 provided with the first transparent electrode 2 is put in a reactive ion plating device and an EC layer 3 is formed as an anode side color forming layer on the first electrode 2 by a reactive ion plating process by using iridium oxide as an evaporating material and H2O vapor (O2 gas can be used together) as an introducing gas. (It is desirable to set the degree of vacuum to about 2-5X10<-4> Torr and set the vapor deposition speed to about 0.6-2Angstrom /sec). Then, an insulating layer [if necessary, the second EC layer (cathode-side color forming layer) 6 of WO3 etc.] and the second electrode 5 of semitransparent Au film, etc. are formed on the EC layer 3 by a vacuum vapor deposition process. Thus, an all solid-state EC element is obtained. |
