发明名称 BANHO DE COBRE SEM ELETROLISE PARA A DEPOSICAO DE COBRE SOBRE UM SUBSTRATO,PROCESSO PARA A DEPOSICAO DE COBRE A PARTIR DE UM BANHO DE COBRE SEM ELETROLISE SOBRE UM SUBSTRATO;ETILENODINITRILO-TETRA-2-PROPANOL
摘要 The improvement in electroless copper plating baths for the deposition of copper onto a substrate wherein ethylenedinitrilotetra-2-propanol (EDTP) is used as complexer. The low boiling contaminants of the commercially available EDTP are removed by a process which avoids the formation of oxidation by-products. The thus treated EDTP renders good and consistent results with respect to deposition rate and copper quality of the deposit.
申请公布号 BR8400185(A) 申请公布日期 1984.08.21
申请号 BR19848400185 申请日期 1984.01.16
申请人 KOLLMORGEN TECHNOLOGIES CORPORATION 发明人 MILAN PAUNOVIC;FRANCIS J. NUZZI
分类号 C07D251/34;A23K1/16;A61K9/08;A61K9/10;A61K31/53;A61K47/08;A61K47/18;A61P33/02;C23C18/40 主分类号 C07D251/34
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