发明名称 |
BANHO DE COBRE SEM ELETROLISE PARA A DEPOSICAO DE COBRE SOBRE UM SUBSTRATO,PROCESSO PARA A DEPOSICAO DE COBRE A PARTIR DE UM BANHO DE COBRE SEM ELETROLISE SOBRE UM SUBSTRATO;ETILENODINITRILO-TETRA-2-PROPANOL |
摘要 |
The improvement in electroless copper plating baths for the deposition of copper onto a substrate wherein ethylenedinitrilotetra-2-propanol (EDTP) is used as complexer. The low boiling contaminants of the commercially available EDTP are removed by a process which avoids the formation of oxidation by-products. The thus treated EDTP renders good and consistent results with respect to deposition rate and copper quality of the deposit. |
申请公布号 |
BR8400185(A) |
申请公布日期 |
1984.08.21 |
申请号 |
BR19848400185 |
申请日期 |
1984.01.16 |
申请人 |
KOLLMORGEN TECHNOLOGIES CORPORATION |
发明人 |
MILAN PAUNOVIC;FRANCIS J. NUZZI |
分类号 |
C07D251/34;A23K1/16;A61K9/08;A61K9/10;A61K31/53;A61K47/08;A61K47/18;A61P33/02;C23C18/40 |
主分类号 |
C07D251/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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