FORMATION OF MAGNETIC LAYER

摘要

PURPOSE:To form an iron oxide group magnetic layer for vertical magnetization with a high speed and excellent reproducibility by a method wherein the temperature of a substrate is kept lower than 500 deg.C while the iron oxide system magnetic layer suitable for vertical magnetization is formed by sputtering and deposition of a magnetic layer composing material. CONSTITUTION:A substrate 6, on which a magnetic thin film is formed, is held vertically to the side between facing targets by a substrate holder 5. The substrate 6 is heated by a heater 11 to be kept at the temperature lower than 500 deg.C. A magnetic field is formed to the direction perpendicular to each surface of a pair of targets T1, T2, facing each other in parallel and sputtered gas ions are accelerated by this magnetic field in an electric field of a cathode-drop portion and give impact against the surface of the target to emit gamma-electrons so that a high density plasma is sputtered sufficiently in the space between the targets T1-T2 and accumulated on the base 6 at the side as a magnetic material.