| 摘要 |
PURPOSE:To form a negative micropattern high in resolution by using a resist compsn. consisting of polyhydroxystyrene and an azide compd. CONSTITUTION:A resist compsn. consists of polyhydroxystyrene having general formula I and an azide compd., such as 4,4'-diazidochalkone, 2,6-bis(4'-azidobenzal)acetone, 2,6-bis(4'-azidobenzal)cyclohexanone, 2,6-bis(4'-azidobenzal)4- methylcyclohexanone, 2,6-bis(4'-azidostyryl)acetone, or diazidostilbene, or a mixture of any of them. Said azide compd. is added to said polyhydroxystyrene having a mol.wt. of <=50,000 in an amt. of 0.001-50wt%. |
