| 摘要 |
PURPOSE:To prevent a pattern breaking in a thin-film and a disconnection through side-etching in a flat section by coating a section side-etched with a mask material during a time when the side-etching of a section having thin film thickness does not progress. CONSTITUTION:A thin-film 23 is etched while using a photo-resist film as a mask. The etching is suspended at that time under the state in which the thin- film 23 in a stepped section 25 is not side-etched remarkably. A side surface is coated completely with a photo-resist including a section side-etched in the stepped section 25. The thin-film 23 in a flat section is patterned completely while using the photo-resist as a mask. |
