发明名称 THIN FILM INSPECTION APPARATUS
摘要 PURPOSE:To enable constantly accurate inspection of a thin film irrespective of thickness of the film, by receiving, through the thin film, small-angle reflecting beam satisfying the Bragg condition from a crystal plane. CONSTITUTION:X-ray parallel beams passing through a slit optical system 14 irradiate a crystal substrate 17 of a specified single crystal material with a required incident angle and after the Bragg reflection, become small-angle dispersing beams through a film 18 of the specified angle of reflection and are received and detected by a film 16. By these arrangement, no deformation occurs even if the film 18 is thin and as the Bragg reflecting light path is long, the light path in the film 18 is lengthened when the film 18 is thin and constantly accurate film inspection becomes available irrespective of the film thickness.
申请公布号 JPS6088341(A) 申请公布日期 1985.05.18
申请号 JP19830195180 申请日期 1983.10.20
申请人 RICOH KK 发明人 TANI KATSUHIKO
分类号 G01M11/00;G01N23/205 主分类号 G01M11/00
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