发明名称 METHOD OF MANUFACTURING MASK PATTERN FOR BEAM-INDEX-TYPE CHROMATIC CATHODE-RAY TUBE
摘要 PURPOSE:To make uniform the distance between the inside of a faceplate and a mask pattern for creating a fluorescent surface on the inside of the faceplate, by using a body die and a push die, which have surfaces of the same curvature as the inside of the faceplate, to manufacture the mask pattern. CONSTITUTION:A mask pattern 2', which is placed near the inside of the faceplate of a beam-index-type chromatic cathode-ray tube or placed in tight contact with the inside of the faceplate to irradiate light from an exposure light source upon the inside surface of the faceplate through the mask pattern to create a fluorescent surface, is made of the same glass as the faceplate 1 by using a push die 20, which has a surface 20a of the same curvature as a push die for forming the faceplate, and a body die 21 which has a surface 21a of the same curvature as a surface only inverse in concaveness and convexness to the surface of the push die for forming the faceplate 1. The mask pattern 2' is positioned as to the inside of the faceplate 1. Ultraviolet rays 27 are irradiated upon the mask pattern 2'. Since the distance between the inside of the faceplate 1 and the mask pattern 2' is made uniform, the fluorescent surface of high accuracy is manufactured.
申请公布号 JPS60151932(A) 申请公布日期 1985.08.10
申请号 JP19840008890 申请日期 1984.01.20
申请人 SANYO DENKI KK 发明人 TERADA KATSUMI;FUNATSUKURI YASUO;MIWA KOUJI
分类号 H01J9/227 主分类号 H01J9/227
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