PHOTOSENSITIVE RESIN LAMINATE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin laminate having a mask layer element with high scratch resistance.SOLUTION: A mask layer element comprises (A) a partially saponified polyvinyl acetate having a saponification degree of 60 to 100 mol%, (B) a cationic polymer, and (C) an infrared ray absorbing substance. The photosensitive resin laminate has the mask layer element.SELECTED DRAWING: None