发明名称 |
ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS |
摘要 |
A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10<6> < K1 < 10<1><2> M<-><1> preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid. |
申请公布号 |
DE3269232(D1) |
申请公布日期 |
1986.03.27 |
申请号 |
DE19823269232 |
申请日期 |
1982.11.11 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BARCLAY, DONALD JOHN;MORGAN, WILLIAM MORRIS;VIGAR, JAMES MICHAEL LINFORD |
分类号 |
C25D3/06;C25D3/10;C25D3/56;(IPC1-7):C25D3/06 |
主分类号 |
C25D3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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