Ion milling device

摘要

The present invention advantageously provides an ion milling device that can set a high-precision processing area with a simple structure. The ion milling device includes a sample holder that holds a sample and a mask partially restricting irradiation of the sample with an ion beam. The sample holder includes a first contact surface that contacts an end surface of the sample located on a passing orbit side of the ion beam, and a second contact surface that contacts an end surface of the mask so that the mask is located at a position spaced apart from the ion beam more than the first contact surface.

主权项

1. An ion milling device comprising:
an ion source for irradiating an upper surface of a sample with an ion beam having an optical axis, the sample further comprising a lower surface and a plurality of side surfaces; a sample stage disposed within a vacuum chamber for the sample to be irradiated with the ion beam; a sample holder, to hold the sample, including a first contact surface and a second contact surface; and a mask to partially limit irradiation of the sample with the ion beam, the mask comprising an upper surface, a lower surface and a plurality of side surfaces, wherein the first contact surface contacts a side surface of the sample that is proximate to the optical axis of the ion beam, and the second contact surface contacts a side surface of the mask that is proximate to the optical axis of the ion beam so that the sample is partially exposed from the mask.