| 摘要 |
PURPOSE:To prevent peeling of a film, and to obtain machine parts which are excellent in abrasion resistance by forming an indium tin oxide film on the surface of the machine parts, and thereafter, forming a film mainly consisting of amorphous silicon. CONSTITUTION:An indium tin oxide film of about 300Angstrom -1mum thick is formed by spattering a target of indium tin oxide in an Ar and O2 gas, on machine parts used for a high-speed sliding part of a revolving shaft, etc., of a polygon mirror for a semiconductor laser printer. Subsequently, on the film, a film mainly consisting of amorphous silicon is formed to about 2mum+ or -0.2mum thick by glow discharge of a gas containing Si. In this way, machine parts which have a film which does not peel by a difference of a coefficient of thermal expansion and use of the slide state, and are excellent in abrasion resistance are obtained. |
