发明名称 A xanthene derivative, a production process of the same and a composite for giving an image which includes the same.
摘要 <p>@ This invention relates to a xanthene derivative that develops colour on oxidation, so that it is favorably used for a photoresist, a PS plate or a proofing agent. The xanthene derivative, which has the following structural formula (I), is produced by putting a fluoran derivative represented by the following structural formula (II) to an esterification reaction and then to a reduction reaction. &lt;Chemistry id="chema01" num="0001"&gt;&lt;Image id="ia01" he="41" wi="54" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /&gt;&lt;/Chemistry&gt;and &lt;Chemistry id="chema02" num="0002"&gt;&lt;Image id="ia02" he="35" wi="59" file="IMGA0002.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /&gt;&lt;/Chemistry&gt;In the above formulae R&lt;Sub&gt;1&lt;/Sub&gt; and R&lt;Sub&gt;2&lt;/Sub&gt; independently stand for hydrogen, an alkyl radical with 1 to 8 carbon atoms, a tetrahydrofurfuryl radical, a substituted or an unsubstituted phenyl radical, a substituted or an unsubstituted benzyl radical or a cyclic alkyl radical; in addition, R&lt;Sub&gt;1&lt;/Sub&gt; and R&lt;Sub&gt;2&lt;/Sub&gt; are able to form a ring in pairs. R&lt;Sub&gt;3&lt;/Sub&gt; and R&lt;Sub&gt;6&lt;/Sub&gt; independently stand for hydrogen, chlorine, fluorine, a lower alkyl radical or a lower alkoxy radical. R&lt;Sub&gt;4&lt;/Sub&gt; and R&lt;Sub&gt;5&lt;/Sub&gt; independently stand for hydrogen. chlorine, fluorine, a lower alkyl radical, a lower alkoxy radical, a lower alkoxyalkyl radical, a substituted or an unsubstituted phenyl radical, a substituted or an unsubstituted benzyl radical, an amino radical, a N-substituted or</p><p>N,N-substituted amino radical or a cyclic alkyl radical; in addition, R&lt;Sub&gt;3&lt;/Sub&gt; and R&lt;Sub&gt;4&lt;/Sub&gt;, R&lt;Sub&gt;4&lt;/Sub&gt; and R&lt;Sub&gt;6&lt;/Sub&gt;, and R&lt;Sub&gt;5&lt;/Sub&gt; and R&lt;Sub&gt;6&lt;/Sub&gt; are able to form a ring in pairs respectively. R&lt;Sub&gt;7&lt;/Sub&gt; stands for an alkyl radical, a substituted or an unsubstituted phenyl radical or a substituted or an unsubstituted benzyl radical. X stands for hydrogen, chlorine, fluorine, bromine, a nitro radical, a lower alkyl radical or a lower alkylamino radical; and n stands for an integer from 1 to 4 inclusive.</p>
申请公布号 EP0184114(A1) 申请公布日期 1986.06.11
申请号 EP19850114982 申请日期 1985.11.26
申请人 HODOGAYA CHEMICAL CO., LTD. 发明人 SENSUI, HIDEYUKI;GONDA, MICHIRO;OBARA, TOSHIO
分类号 C07B61/00;C07D311/82;G03C1/00;G03C1/675;G03F7/004;G03F7/105;(IPC1-7):C07D311/82;G03F7/26 主分类号 C07B61/00
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