发明名称 PROJECTION EXPOSURE APPARATUS
摘要 PURPOSE:To alter the position of an illumination system with respect to the alteration of the thickness and the material of reticles in a short time by movably providing the system with respect to the incident optical axis direction of a projection optical system and providing means for regulating the position in response to the optical path length. CONSTITUTION:The light of an LED 10 is reflected on reticles 12, and the reflected light is received by photoreceptors 11 to detect the distance from a reticle holder 13 to the upper surface of the reticles 12, i.e., the thickness of the reticles 12. A calculation controller 30 calculates the moving distances of an illumination system 6 and an alignment optical system 26 by the value of the thickness of the reticles 12 as the output of a thickness detector made of the LED 10 and the photoreceptors 11 and the refractive index in response to the quality of the reticle 12 input from a refractive index setter 31. Further, the controller 30 applies a command of the moving distance of the calculated result to an illumination system moving mechanism 7 and an alignment optical system moving mechanism 27 to move them.
申请公布号 JPS61202431(A) 申请公布日期 1986.09.08
申请号 JP19850042718 申请日期 1985.03.06
申请人 CANON INC 发明人 YOMODA MINORU
分类号 G03F7/20;H01L21/027;H01L21/30 主分类号 G03F7/20
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