发明名称 VACUUM DEPOSITION DEVICE
摘要 PURPOSE:To prevent the contamination of a vessel for a vacuum deposition device and the deterioration of the electric insulation thereof by disposing a cylindrical device for preventing the scattering of vapor deposition particles between a crucible and substrate. CONSTITUTION:The device 8 for preventing the scattering of the vapor deposition particles is disposed between the crucible 6 and the substrate 2 by using an attaching device 9 in such a manner that apertures 8a, 8a thereof are directed toward the crucible 6 and the substrate. The device 8 is formed as the cylinder expanding diametrally from the crucible 6 side toward the substrate 2 side. The vapor deposition particles 3 evaporating from an evaporation material scatter in various directions and the effective vapor deposition particles 3a contribute to the vacuum deposition on the substrate. The ineffective vapor deposition particles 3b which do not contribute to the vacuum deposition are forcibly stuck to the inside wall of the device 8. The vacuum deposition material accumulating on the inside wall is recovered and reused after the end of the vacuum deposition. The contamination in the vessel is prevented by such mechanism and the utilizing efficiency of the vacuum deposition material is improved.
申请公布号 JPS61207571(A) 申请公布日期 1986.09.13
申请号 JP19850046346 申请日期 1985.03.11
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMAGUCHI FUMITOSHI
分类号 C23C14/24 主分类号 C23C14/24
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