发明名称 Positive, radiation-sensitive coating solution
摘要 A positive, radiation-sensitive coating solution is described which as essential constituents comprises a radiation-sensitive compound, for example a 1,2-naphthoquinone diazide or a radiation-sensitive combination of compounds, for example a compound having at least one C-O-C bond which can be cleaved by acid and a compound forming a strong acid upon irradiation, and an organic solvent or solvent mixture which at least predominantly consists of a mono(C1 to C4)alkyl ether of 1,2-propanediol. The solution is less toxic and gives better film levelling than conventional positive-resist solutions.
申请公布号 DE3510220(A1) 申请公布日期 1986.09.25
申请号 DE19853510220 申请日期 1985.03.21
申请人 HOECHST AG 发明人 RUCKERT,HANS,DIPL.-CHEM.DR.;OHLENMACHER,RAHLF
分类号 G03F7/004;G03F7/022;(IPC1-7):G03F7/00 主分类号 G03F7/004
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