发明名称 |
Positive, radiation-sensitive coating solution |
摘要 |
A positive, radiation-sensitive coating solution is described which as essential constituents comprises a radiation-sensitive compound, for example a 1,2-naphthoquinone diazide or a radiation-sensitive combination of compounds, for example a compound having at least one C-O-C bond which can be cleaved by acid and a compound forming a strong acid upon irradiation, and an organic solvent or solvent mixture which at least predominantly consists of a mono(C1 to C4)alkyl ether of 1,2-propanediol. The solution is less toxic and gives better film levelling than conventional positive-resist solutions.
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申请公布号 |
DE3510220(A1) |
申请公布日期 |
1986.09.25 |
申请号 |
DE19853510220 |
申请日期 |
1985.03.21 |
申请人 |
HOECHST AG |
发明人 |
RUCKERT,HANS,DIPL.-CHEM.DR.;OHLENMACHER,RAHLF |
分类号 |
G03F7/004;G03F7/022;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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